Fluid handling structure for lithographic apparatus

• Main Authors: Tanasa, Gheorghe, Rops, Cornelius Maria, Cuypers, Koen, Keukens, Floor Lodewijk, Frencken, Mark Johannes Hermanus, Gattobigio, Giovanni Luca, Cortie, Rogier Hendrikus Magdalena, Ten Kate, Nicolaas, Van Vliet, Evert, Teunissen, Marcel Maria Cornelius Franciscus, Buddenberg, Harold Sebastiaan, Polet, Theodorus Wilhelmus, Van Erve, Jantien Laura, Van Den Eijnden, Pepijn
• Format: Patent
• Language: English
• Published: 08.06.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.