Mask assembly

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the pattern...

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Bibliographic Details
Main Authors Bogaart, Erik Willem, Bruijn, Marc, Janssen, Paul, Kamali, Mohammad Reza, Jansen, Maarten Mathijs Marinus, Bruls, Richard Joseph, Van Der Meulen, Frits, Lipson, Matthew, Roux, Stephen, Leenders, Martinus Hendrikus Antonius, Van Der Graaf, Sandra, Van Loo, Jérôme François Sylvain Virgile, Brouns, Derk Servatius Gertruda, Van Den Bosch, Gerrit, Kruizinga, Matthias, Lansbergen, Robert Gabriël Maria, Verbrugge, Beatrijs Louise Marie-Joseph Katrien, Azeredo Lima, Jorge Manuel, Kramer, Ronald Harm Gunther, Dekkers, Jeroen, Loopstra, Erik Roelof, Van Den Heijkant, Sander, Lyons, Joseph H
Format Patent
LanguageEnglish
Published 18.05.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Bibliography:Application Number: US201916587483