Object processing state sensing using RF radiation

Apparatus and method for applying RF energy to determine a processing state of an object placed in a cavity, during processing of the object. The method includes applying RF energy to the object during the processing via at least one radiating element, receiving RF feedback from in or around the cav...

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Bibliographic Details
Main Authors Yaari, Igal, Ron, Amichai, Ben Haim, Yuval, Berezin, Maksim, Hadad, Sharon, Libman, Avner, Silcoff, Elliad
Format Patent
LanguageEnglish
Published 18.05.2021
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:Apparatus and method for applying RF energy to determine a processing state of an object placed in a cavity, during processing of the object. The method includes applying RF energy to the object during the processing via at least one radiating element, receiving RF feedback from in or around the cavity, said RF feedback being indicative of a dielectric response of the cavity and/or the object to electromagnetic (EM) fields excited in the cavity, mathematically manipulating the RF feedback to obtain computed RF feedback, determining one or more processing states of the object based on a correlation between the computed RF feedback and the one or more processing states of the object, and monitoring the computed RF feedback during the applying to monitor the one or more processing states of the object.
Bibliography:Application Number: US201816119245