Methods and apparatus for metrology

• Main Authors: Smorenburg, Petrus Wilhelmus, Mossavat, Seyed Iman, Coenen, Teis Johan
• Format: Patent
• Language: English
• Published: 04.05.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS THEREFOR; MEASURING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TESTING

Methods and apparatus for directing onto a substrate a radiation beam emitted as a result of high harmonic generation (HHG). Exemplary apparatus comprising: a drive radiation source; an interaction region configured to receive a medium and positioned such that a drive radiation beam from the drive radiation source interacts with the medium during use to generate the emitted radiation beam by HHG, wherein the emitted radiation beam comprises a plurality of wavelengths and wherein an emission divergence angle of the emitted radiation is wavelength dependent; an optical system downstream of the interaction region and configured to focus the emitted radiation beam, wherein the plurality of wavelengths of the emitted radiation beam are focused at a plurality of focal planes in dependence on the associated emission divergence angle; and a substrate support for holding the substrate at one of a plurality of axial positions relative to the plurality of focal planes, wherein one or more of the drive radiation source, the interaction region, the optical system and the substrate support is configurable to control a relative position of at least one of the focal planes with respect to the substrate.