Systems and methods for precision fabrication of an orifice within an integrated circuit

A method for fabricating an orifice in a semiconductor which can include: removing a first depth of the semiconductor using a first material removal technique and removing a second depth of the semiconductor using a second material removal technique. The method can optionally include: adding a sacri...

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Bibliographic Details
Main Author Fricker, Jean-Philippe
Format Patent
LanguageEnglish
Published 06.04.2021
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