Pellicle attachment apparatus

Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the...

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Main Authors Janssen, Maurice Leonardus Johannes, Jansen, Maarten Mathijs Marinus, Leenders, Martinus Hendrikus Antonius, Middel, Geert, Van Den Bosch, Gerrit, Kerstens, Roland Jacobus Johannes, Van Lievenoogen, Anne Johannes Wilhelmus, Kruizinga, Matthias, Kramer, Ronald Harm Gunther, Dekkers, Jeroen, Loopstra, Erik Roelof, Kester, Martinus Jozef Maria, Bruijn, Marc, Janssen, Paul, Van Der Meulen, Frits, Van Loo, Jérôme François Sylvain Virgile, Brouns, Derk Servatius Gertruda, Theuerzeit, Frank Johannes Christiaan, De Klerk, Angelo Cesar Peter, Reijnders, Silvester Matheus, Dings, Jacobus Maria, Lansbergen, Robert Gabriël Maria, Verbrugge, Beatrijs Louise Marie-Joseph Katrien, Azeredo Lima, Jorge Manuel, Loos, Michel
Format Patent
LanguageEnglish
Published 06.04.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Bibliography:Application Number: US201916572156