Methods and systems for adjusting exhaust gas flow through an aftertreatment device
Methods and systems are provided for a flow device shaped to adjust flow to radial positions of an emission control device. In one example, a system may include where the flow device comprises a plurality of inner openings that align while a plurality of outer openings are misaligned to flow exhaust...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
16.03.2021
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Subjects | |
Online Access | Get full text |
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Summary: | Methods and systems are provided for a flow device shaped to adjust flow to radial positions of an emission control device. In one example, a system may include where the flow device comprises a plurality of inner openings that align while a plurality of outer openings are misaligned to flow exhaust gas proximal to a central axis of an exhaust passage, and where the plurality of outer openings are aligned and the plurality of inner openings are misaligned to flow exhaust gas distal to the central axis. |
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Bibliography: | Application Number: US201916286452 |