Illumination system and projection apparatus

• Main Authors: Chen, Shun-Tai, Lin, Shu-Yu, Hong, Chen-Yi, Fan, Chen-Wei, Weng, Ming-Tsung
• Format: Patent
• Language: English
• Published: 16.02.2021
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; BLASTING; CINEMATOGRAPHY; ELECTROGRAPHY; FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMSTHEREOF; HEATING; HOLOGRAPHY; LIGHTING; MECHANICAL ENGINEERING; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHOTOGRAPHY; PHYSICS; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHERARTICLES, NOT OTHERWISE PROVIDED FOR; WEAPONS

An illumination system including a first excitation light source, a wavelength conversion wheel, and a filter wheel is provided. The first excitation light source is configured to emit a first excitation beam. The wavelength conversion wheel includes a wavelength conversion region and a first optical region. The wavelength conversion region and the first optical region alternately enter a transmission path of the first excitation beam. The first excitation beam is converted into a conversion beam by the wavelength conversion region when the wavelength conversion region enters the transmission path of the first excitation beam. The filter wheel includes a first region, a second region, and a blocking region. An angle covered by the second region in a circumferential direction is smaller than an angle covered by the first optical region. A projection apparatus is also provided.