Removal of inorganic coatings from glass substrates
Methods of etching an inorganic layer on a glass substrate are described, the methods comprising contacting the glass substrate including an inorganic layer with an etching solution comprising a polar organic solvent and an etchant, wherein the inorganic layer is removed at an inorganic layer etchin...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
19.01.2021
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Methods of etching an inorganic layer on a glass substrate are described, the methods comprising contacting the glass substrate including an inorganic layer with an etching solution comprising a polar organic solvent and an etchant, wherein the inorganic layer is removed at an inorganic layer etching rate and the glass substrate is etched as a glass etching rate. |
---|---|
Bibliography: | Application Number: US201615356785 |