Removal of inorganic coatings from glass substrates

Methods of etching an inorganic layer on a glass substrate are described, the methods comprising contacting the glass substrate including an inorganic layer with an etching solution comprising a polar organic solvent and an etchant, wherein the inorganic layer is removed at an inorganic layer etchin...

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Bibliographic Details
Main Authors Jin, Yuhui, Li, Aize
Format Patent
LanguageEnglish
Published 19.01.2021
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Summary:Methods of etching an inorganic layer on a glass substrate are described, the methods comprising contacting the glass substrate including an inorganic layer with an etching solution comprising a polar organic solvent and an etchant, wherein the inorganic layer is removed at an inorganic layer etching rate and the glass substrate is etched as a glass etching rate.
Bibliography:Application Number: US201615356785