Lithographic apparatus and device manufacturing method

A lithographic apparatus is described, the apparatus comprising: a projection system (PS; 200) configured to project a patterned beam (B) of radiation onto a substrate (W); the projection system comprising a plurality of optical elements (200.1, 200.2); a sensor frame (220); a first position measure...

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Main Authors Vervoordeldonk, Michael Johannes, Wijckmans, Maurice Willem Jozef Etiënne, Butler, Hans
Format Patent
LanguageEnglish
Published 15.12.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract A lithographic apparatus is described, the apparatus comprising: a projection system (PS; 200) configured to project a patterned beam (B) of radiation onto a substrate (W); the projection system comprising a plurality of optical elements (200.1, 200.2); a sensor frame (220); a first position measurement system (240) configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: - N sub-frames (220.1, 220.2), N being an integer > 1, - a coupling system (220.3) coupling the N sub-frames and - a second position measurement system (250) configured to determine a relative position of the N sub-frames.
AbstractList A lithographic apparatus is described, the apparatus comprising: a projection system (PS; 200) configured to project a patterned beam (B) of radiation onto a substrate (W); the projection system comprising a plurality of optical elements (200.1, 200.2); a sensor frame (220); a first position measurement system (240) configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: - N sub-frames (220.1, 220.2), N being an integer > 1, - a coupling system (220.3) coupling the N sub-frames and - a second position measurement system (250) configured to determine a relative position of the N sub-frames.
Author Vervoordeldonk, Michael Johannes
Butler, Hans
Wijckmans, Maurice Willem Jozef Etiënne
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Snippet A lithographic apparatus is described, the apparatus comprising: a projection system (PS; 200) configured to project a patterned beam (B) of radiation onto a...
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SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title Lithographic apparatus and device manufacturing method
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