Lithographic apparatus and device manufacturing method
A lithographic apparatus is described, the apparatus comprising: a projection system (PS; 200) configured to project a patterned beam (B) of radiation onto a substrate (W); the projection system comprising a plurality of optical elements (200.1, 200.2); a sensor frame (220); a first position measure...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
15.12.2020
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Subjects | |
Online Access | Get full text |
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Summary: | A lithographic apparatus is described, the apparatus comprising: a projection system (PS; 200) configured to project a patterned beam (B) of radiation onto a substrate (W); the projection system comprising a plurality of optical elements (200.1, 200.2); a sensor frame (220); a first position measurement system (240) configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: - N sub-frames (220.1, 220.2), N being an integer > 1, - a coupling system (220.3) coupling the N sub-frames and - a second position measurement system (250) configured to determine a relative position of the N sub-frames. |
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Bibliography: | Application Number: US201816483660 |