Apparatus for collection and subsequent reaction of liquid and solid effluent into gaseous effluent
Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream...
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| Main Authors | , , , |
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| Format | Patent |
| Language | English |
| Published |
08.12.2020
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| Subjects | |
| Online Access | Get full text |
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| Abstract | Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate. |
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| AbstractList | Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate. |
| Author | Downey, Ryan T L'Heureux, James Hou, David Muquing Rozenzon, Yan |
| Author_xml | – fullname: Hou, David Muquing – fullname: L'Heureux, James – fullname: Downey, Ryan T – fullname: Rozenzon, Yan |
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| Notes | Application Number: US201815961482 |
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| PublicationDateYYYYMMDD | 2020-12-08 |
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| RelatedCompanies | Applied Materials, Inc |
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| Snippet | Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust... |
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| SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SEPARATION TRANSPORTING |
| Title | Apparatus for collection and subsequent reaction of liquid and solid effluent into gaseous effluent |
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