Method of forming electrical contacts in layered structures

The present disclosure is directed to a method of forming a layered structure including a nanostructure layer having nanostructures. The method includes: forming a coating layer on the surface of the nanostructure layer, reflowing the coating layer, depositing one or more conductive plugs into the c...

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Bibliographic Details
Main Authors Mansky, Paul, Biyani, Kalpesh
Format Patent
LanguageEnglish
Published 01.12.2020
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Summary:The present disclosure is directed to a method of forming a layered structure including a nanostructure layer having nanostructures. The method includes: forming a coating layer on the surface of the nanostructure layer, reflowing the coating layer, depositing one or more conductive plugs into the coating layer, and hardening the coating layer. The one or more conductive plugs each has a first portion configured to be placed in electrical communication with the nanostructure layer and a second portion not covered by the coating layer.
Bibliography:Application Number: US201916398666