Image sensor having PD bias patterns

An image sensor may include a photosensing region in a substrate and configured to generate photoelectrons in response to an incident light on the photodiode region, conductive bias patterns disposed to be spaced apart from one another and surrounding the photosensing region, and pixel isolation pat...

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Bibliographic Details
Main Author Oh, Sun-Ho
Format Patent
LanguageEnglish
Published 10.11.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC COMMUNICATION TECHNIQUE
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PICTORIAL COMMUNICATION, e.g. TELEVISION
SEMICONDUCTOR DEVICES
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Summary:An image sensor may include a photosensing region in a substrate and configured to generate photoelectrons in response to an incident light on the photodiode region, conductive bias patterns disposed to be spaced apart from one another and surrounding the photosensing region, and pixel isolation patterns that are spaced apart from and disposed in a periphery of the conductive bias patterns.
Bibliography:Application Number: US201816219151