Integrated circuit layout generation method and system
A method of generating an integrated circuit (IC) layout diagram of an IC device includes receiving a layout diagram of the IC device, the IC layout diagram including a gate region having a width across an active region, and a gate via positioned at a location along the width. The location is used t...
Saved in:
Main Authors | , , , |
---|---|
Format | Patent |
Language | English |
Published |
06.10.2020
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A method of generating an integrated circuit (IC) layout diagram of an IC device includes receiving a layout diagram of the IC device, the IC layout diagram including a gate region having a width across an active region, and a gate via positioned at a location along the width. The location is used to divide the width into a plurality of width segments, an effective resistance of the gate region is calculated based on the plurality of width segments, and the effective resistance is used to determine whether the IC layout diagram complies with a design specification. |
---|---|
Bibliography: | Application Number: US201916294735 |