Lithographic apparatus

• Main Authors: Van Der Sanden, Jacobus Cornelis Gerardus, De Hoogh, Joost, De Wit, Paul Comé Henri, Van Der Meulen, Frits, Van Berkel, Koos, Gijzen, Ronald Cornelis Gerardus, Hemschoote, Dries Vaast Paul, Hoogendam, Christiaan Alexander, Van Der Schoot, Harmen Klaas, Westerhuis, Evert Auke Rinze, Cox, Hendrikus Herman Marie, Van Der Meulen, Stan Henricus, Overkamp, Jim Vincent, Limpens, Patrick Willem Paul, Arlemark, Erik Johan, Koevoets, Adrianus Hendrik, Lafarre, Raymond Wilhelmus Louis, Vles, David Ferdinand, Leroux, Alain Louis Claude, Valentin, Christiaan Louis, Cuijpers, Martinus Agnes Willem, De Vries, Gosse Charles, Derks, Sander Catharina Reinier
• Format: Patent
• Language: English
• Published: 18.08.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.