Patterning device

A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength...

Full description

Saved in:
Bibliographic Details
Main Authors Finders, Jozef Maria, Sladkov, Maksym Yuriiovych, Van De Kerkhof, Marcus Adrianus, Dikkers, Manfred Petrus Johannes Maria, Baselmans, Johannes Jacobus Matheus, De Groot, Pieter Cristiaan, Schasfoort, Gerard Frans Jozef, De Winter, Laurentius Cornelius, Engelen, Wouter Joep, Baumer, Stefan Michael Bruno, Voogd, Robbert Jan, Van Zwol, Pieter-Jan
Format Patent
LanguageEnglish
Published 04.08.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
Bibliography:Application Number: US201916502674