Lithographic method
A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured t...
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| Main Authors | , , , , , , , , , |
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| Format | Patent |
| Language | English |
| Published |
07.07.2020
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| Subjects | |
| Online Access | Get full text |
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| Abstract | A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing. |
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| AbstractList | A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing. |
| Author | Huang, Yang-Shan Jeunink, Andre Bernardus Tolsma, Hoite Pieter Theodoor Van Der Meulen, Stan Henricus Schouten, Christine Henriette La Torre, Federico Van Bokhoven, Laurentius Johannes Adrianus Moest, Bearrach Van Den Brink, Enno Keij, Stefan Carolus Jacobus Antonius |
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| Notes | Application Number: US201916716568 |
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| Snippet | A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable... |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| Title | Lithographic method |
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