Lithographic method

A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured t...

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Bibliographic Details
Main Authors Schouten, Christine Henriette, Huang, Yang-Shan, Jeunink, Andre Bernardus, Keij, Stefan Carolus Jacobus Antonius, La Torre, Federico, Moest, Bearrach, Tolsma, Hoite Pieter Theodoor, Van Bokhoven, Laurentius Johannes Adrianus, Van Der Meulen, Stan Henricus, Van Den Brink, Enno
Format Patent
LanguageEnglish
Published 07.07.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
Bibliography:Application Number: US201916716568