Oven

Provided is an oven having an improved structure for keeping a cooking chamber clean. The oven includes a main body, a cooking chamber provided inside the main body, a main heater disposed inside the cooking chamber, a fan disposed inside the cooking chamber to circulate air heated by the main heate...

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Bibliographic Details
Main Authors Hayashi, Shigeki, Takenoshita, Kazutoshi, Kida, Yurika, Iwamoto, Kiyoshi, Urai, Yasushi, Doi, Toshihiro, Sato, Seiji
Format Patent
LanguageEnglish
Published 02.06.2020
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Summary:Provided is an oven having an improved structure for keeping a cooking chamber clean. The oven includes a main body, a cooking chamber provided inside the main body, a main heater disposed inside the cooking chamber, a fan disposed inside the cooking chamber to circulate air heated by the main heater, a coating film formed on at least a part of a cooking chamber inner wall and having a liquid repellency, and a contaminant collecting portion having a liquid repellency smaller than that of the coating film and provided on the cooking chamber inner wall with which air circulated by the fan collides.
Bibliography:Application Number: US201716077428