Lithographic apparatus and device manufacturing method
A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between th...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
07.04.2020
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Subjects | |
Online Access | Get full text |
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Summary: | A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate. |
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Bibliography: | Application Number: US201715794256 |