Method of making and device having a common electrode for transistor gates and capacitor plates

Disclosed herein is a circuit comprising a first thin film transistor (TFT) and storage capacitor having a first electrode and a second electrode configured to face to each other. A second TFT is coupled to the capacitor, wherein a first gate electrode of the first TFT, a first electrode of the stor...

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Bibliographic Details
Main Authors Choo, Kyoseop, Lee, Guensik, Han, Manhyeop
Format Patent
LanguageEnglish
Published 03.03.2020
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Summary:Disclosed herein is a circuit comprising a first thin film transistor (TFT) and storage capacitor having a first electrode and a second electrode configured to face to each other. A second TFT is coupled to the capacitor, wherein a first gate electrode of the first TFT, a first electrode of the storage capacitor and a second gate electrode of the second TFT are integrally formed.
Bibliography:Application Number: US201816153482