High-voltage supply unit and circuit arrangement for generating a high voltage for a particle beam apparatus

The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact...

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Bibliographic Details
Main Authors Preikszas, Dirk, Fichter, Edgar, Fober, Joerg, Hendrich, Christian, Schnell, Michael, Mommsen, Momme
Format Patent
LanguageEnglish
Published 28.01.2020
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Summary:The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.
Bibliography:Application Number: US201815924836