Gas supply unit and thin film deposition apparatus including the same
A gas supply unit includes a base plate, a plurality of gas supply regions protruding from the base plate and arranged on the base plate in a circumferential direction, and a plurality of sidewall trenches alternating with the gas supply regions on the base plate. A distance between opposing surface...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
07.01.2020
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Subjects | |
Online Access | Get full text |
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Summary: | A gas supply unit includes a base plate, a plurality of gas supply regions protruding from the base plate and arranged on the base plate in a circumferential direction, and a plurality of sidewall trenches alternating with the gas supply regions on the base plate. A distance between opposing surfaces of the base plate increases in a radial direction from a center of the base plate in each of the plurality of sidewall trenches, so each of the plurality of sidewall trenches has a depth that decreases in the radial direction from the center of the base plate. |
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Bibliography: | Application Number: US201715485433 |