Pixel structure and manufacturing method thereof, array substrate and display apparatus
A manufacturing method of the invention, comprising: successively forming an insulation layer and a photoresist layer on a transparent substrate; performing an exposure and a development on the photoresist layer by a back exposure process, so as to form a trench in the photoresist layer, an open are...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
17.12.2019
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Subjects | |
Online Access | Get full text |
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Summary: | A manufacturing method of the invention, comprising: successively forming an insulation layer and a photoresist layer on a transparent substrate; performing an exposure and a development on the photoresist layer by a back exposure process, so as to form a trench in the photoresist layer, an open area of the trench proximal to the insulation layer is larger than that of the trench distal to the insulation layer; removing a portion of insulation material in a region of the insulation layer exposed through the trench by an etching process, so as to form a slot in the insulation layer; forming a metal layer on a side of the photoresist layer distal to the insulation layer, a portion of the metal layer is embedded in the slot; removing the photoresist layer and the metal layer thereon by a stripping process, and retaining the portion of the metal layer in the slot. |
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Bibliography: | Application Number: US201615518911 |