Electrostatic chuck assembly having a dielectric filler

Embodiments include an electrostatic chuck assembly having an electrostatic chuck mounted on an insulator. The electrostatic chuck and insulator may be within a chamber volume of a process chamber. In an embodiment, a ground shield surrounds the electrostatic chuck and the insulator, and a gap betwe...

Full description

Saved in:
Bibliographic Details
Main Authors Doan, Kenny L, Lee, Evans Yip, Shoji, Sergio Fukuda, Cho, Jaeyong, Noorbakhsh, Hamid, Ramaswamy, Kartik, Husain, Anwar, Zhang, Chunlei, Wang, Haitao
Format Patent
LanguageEnglish
Published 10.12.2019
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Embodiments include an electrostatic chuck assembly having an electrostatic chuck mounted on an insulator. The electrostatic chuck and insulator may be within a chamber volume of a process chamber. In an embodiment, a ground shield surrounds the electrostatic chuck and the insulator, and a gap between the ground shield and the electrostatic chuck provides an environment at risk for electric field emission. A dielectric filler can be placed within the gap to reduce a likelihood of electric field emission. The dielectric filler can have a flexible outer surface that covers or attaches to the electrostatic chuck, or an interface between the electrostatic chuck and the insulator Other embodiments are also described and claimed.
Bibliography:Application Number: US201715495909