Three-dimensional memory device with gated contact via structures and method of making thereof

A three-dimensional memory device includes laterally spaced apart vertically alternating stacks of insulating strips and word line electrically conductive strips located over a substrate, memory stack structures extending through the multiple vertically alternating stacks, word line contact via stru...

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Bibliographic Details
Main Authors Tsutsumi, Masanori, Hosoda, Naohiro
Format Patent
LanguageEnglish
Published 22.10.2019
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Summary:A three-dimensional memory device includes laterally spaced apart vertically alternating stacks of insulating strips and word line electrically conductive strips located over a substrate, memory stack structures extending through the multiple vertically alternating stacks, word line contact via structures contacting a top surface of the respective word line electrically conductive strips, field effect transistors overlying the word line contact via structures, and connector line structures which are electrically connected to respective subsets of the word line electrically conductive strips in different vertically alternating stacks through the field effect transistors.
Bibliography:Application Number: US201715717102