Method of discharging residual liquid in liquefied gas tank

Water is injected into a top of a liquefied gas tank (water injection step); residual stored liquid in the tank is vaporized by heats of water injected in the water injection step so that the vaporized gas discharges from the top of the tank (residual liquid vaporization/discharge step); even after...

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Bibliographic Details
Main Author Setaka, Hirotomo
Format Patent
LanguageEnglish
Published 10.09.2019
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Summary:Water is injected into a top of a liquefied gas tank (water injection step); residual stored liquid in the tank is vaporized by heats of water injected in the water injection step so that the vaporized gas discharges from the top of the tank (residual liquid vaporization/discharge step); even after all of the stored liquid is vaporized in the residual liquid vaporization/discharge step, the injection of the water into the tank is continued to melt ice solidified through cold heat appropriation of the stored liquid in the residual liquid vaporization/discharge step and return the temperature in the tank to normal temperature (hot-up step); and attained is water discharge from a bottom of the tank having the temperature in the tank returned to normal temperature in the hot-up step while inert gas is supplied into the tank (water discharge step).
Bibliography:Application Number: US201615291841