Working surface cleaning system and method
A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes include wafer sort test for cleaning of probe card pins and FEOL tooling for cleaning during wafer handling equipment and wafer chucks. The deb...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
10.09.2019
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes include wafer sort test for cleaning of probe card pins and FEOL tooling for cleaning during wafer handling equipment and wafer chucks. The debris collected on the cleaning wafer working surfaces is removed by the particle removal film allowing the debris and foreign matter to be discarded. The use of the cleaning film allows the operator to refresh the cleaning wafer without use of an outside vendor and eliminates wet washing and the use of solvents in the cleaning process. |
---|---|
AbstractList | A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes include wafer sort test for cleaning of probe card pins and FEOL tooling for cleaning during wafer handling equipment and wafer chucks. The debris collected on the cleaning wafer working surfaces is removed by the particle removal film allowing the debris and foreign matter to be discarded. The use of the cleaning film allows the operator to refresh the cleaning wafer without use of an outside vendor and eliminates wet washing and the use of solvents in the cleaning process. |
Author | Duvall, James H Humphrey, Alan Broz, Jerry |
Author_xml | – fullname: Broz, Jerry – fullname: Duvall, James H – fullname: Humphrey, Alan |
BookMark | eNrjYmDJy89L5WTQCs8vys7MS1coLi1KS0xOVUjOSU3MAwtUFpek5iok5qUo5KaWZOSn8DCwpiXmFKfyQmluBkU31xBnD93Ugvz41OICoO681JL40GBDAxMDM1MzCycjY2LUAAAryisD |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
ExternalDocumentID | US10406568B2 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_US10406568B23 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 12:55:37 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_US10406568B23 |
Notes | Application Number: US201916290789 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190910&DB=EPODOC&CC=US&NR=10406568B2 |
ParticipantIDs | epo_espacenet_US10406568B2 |
PublicationCentury | 2000 |
PublicationDate | 20190910 |
PublicationDateYYYYMMDD | 2019-09-10 |
PublicationDate_xml | – month: 09 year: 2019 text: 20190910 day: 10 |
PublicationDecade | 2010 |
PublicationYear | 2019 |
RelatedCompanies | INTERNATIONAL TEST SOLUTIONS, INC |
RelatedCompanies_xml | – name: INTERNATIONAL TEST SOLUTIONS, INC |
Score | 3.2199016 |
Snippet | A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | CLEANING CLEANING IN GENERAL MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES PERFORMING OPERATIONS PHYSICS PREVENTION OF FOULING IN GENERAL TESTING TRANSPORTING |
Title | Working surface cleaning system and method |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190910&DB=EPODOC&locale=&CC=US&NR=10406568B2 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8NAEB5Kfd40KlofRJAchGAfySY9BCFJQxH6wDbSW-kms6CHbWlS_PvOrqn1otdZmN2dZfbbmZ0HwAMTzEXCGZu3uWM7yLo293JhC1fwHJsOYkflOw-GrJ86LzN3VoOPbS6MrhP6qYsjkkZlpO-lvq9XOydWrGMriyf-TqTlczINYquyjgndCP6sOAx641E8iqwoCtKJNXxVTW4JbJkf0nW9R89oTxttb6HKSln9hpTkBPbHxE2Wp1BDacBRtO28ZsDhoPrwNuBAR2hmBRErLSzO4LHycJvFZi1o9SYd_UJqgq7LbC5kbn63hj6H-6Q3jfo2TT__2es8nexW2rmAulxKvASTccFIpOi7nrIR3IXAbpZx5F7LyR0fr6DxN5_Gf4PXcKzkpkIgWs0bqJfrDd4Szpb8TgvoC-MngnM |
link.rule.ids | 230,309,783,888,25577,76883 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT4NAEJ409VFvihqtL0wMBxNiH7DQAzEBSlALbSyY3hoWdhM90KbQ-PcdVmq96HU2md2dzey3MzsPgDvCic4QZ1Tao5qqMTJQqZFxleucZqyjMdav8p2DkPix9jzTZw342OTCiDqhn6I4ImpUivpeivt6uXViuSK2snig70haPHqR5Sq1dYzohvCnuLY1nIzdsaM4jhVPlfC1anKLYEtMG6_rHXxim8JUerOrrJTlb0jxDmF3gtzy8ggaLJeg5Ww6r0mwH9Qf3hLsiQjNtEBirYXFMdzXHm65WK84rl7Go09yQRB1meUkz-Tv1tAncOsNI8dXcfr5z17n8XS70v4pNPNFzs5AJpQTFCkzdaOyEfSEs0GaUkaNrpZpJjuH9t982v8N3kDLj4LRfPQUvlzAQSXDKhyi27mEZrlasyvE3JJeC2F9ASjIhWM |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Working+surface+cleaning+system+and+method&rft.inventor=Broz%2C+Jerry&rft.inventor=Duvall%2C+James+H&rft.inventor=Humphrey%2C+Alan&rft.date=2019-09-10&rft.externalDBID=B2&rft.externalDocID=US10406568B2 |