Lithographic apparatus
A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to p...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
27.08.2019
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Subjects | |
Online Access | Get full text |
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