Lithographic apparatus

A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to p...

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Bibliographic Details
Main Authors Overkamp, Jim Vincent, Van Der Sanden, Jacobus Cornelis Gerardus, Den Boef, Arie Jeffrey, De Wit, Paul Corné Henri, Van Der Meulen, Frits, Koevoets, Adrianus Hendrik, Cox, Hendrikus Herman Marie
Format Patent
LanguageEnglish
Published 27.08.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.
Bibliography:Application Number: US201716326410