Lithographic apparatus

A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to p...

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Main Authors Overkamp, Jim Vincent, Van Der Sanden, Jacobus Cornelis Gerardus, Den Boef, Arie Jeffrey, De Wit, Paul Corné Henri, Van Der Meulen, Frits, Koevoets, Adrianus Hendrik, Cox, Hendrikus Herman Marie
Format Patent
LanguageEnglish
Published 27.08.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.
AbstractList A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.
Author Den Boef, Arie Jeffrey
Overkamp, Jim Vincent
De Wit, Paul Corné Henri
Van Der Sanden, Jacobus Cornelis Gerardus
Van Der Meulen, Frits
Koevoets, Adrianus Hendrik
Cox, Hendrikus Herman Marie
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– fullname: Van Der Sanden, Jacobus Cornelis Gerardus
– fullname: Den Boef, Arie Jeffrey
– fullname: De Wit, Paul Corné Henri
– fullname: Van Der Meulen, Frits
– fullname: Koevoets, Adrianus Hendrik
– fullname: Cox, Hendrikus Herman Marie
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Snippet A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held...
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SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title Lithographic apparatus
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