Apparatus for controlling temperature uniformity of a substrate

Apparatus for controlling the thermal uniformity of a substrate can control the thermal uniformity of the substrate to be more uniform or to be non-uniform. In some embodiments, an apparatus for controlling the thermal uniformity of a substrate includes: a substrate support having a support surface...

Full description

Saved in:
Bibliographic Details
Main Authors Bera, Kallol, Kumar, Surajit, Buchberger, Jr., Douglas A, Nguyen, Andrew, Tavassoli, Hamid, Zhou, Xiaoping, Rauf, Shahid
Format Patent
LanguageEnglish
Published 20.08.2019
Subjects
BLASTING
DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OFGENERAL APPLICATION
HEAT EXCHANGE IN GENERAL
HEATING
LIGHTING
MECHANICAL ENGINEERING
WEAPONS
Online AccessGet full text

Cover

More Information
Summary:Apparatus for controlling the thermal uniformity of a substrate can control the thermal uniformity of the substrate to be more uniform or to be non-uniform. In some embodiments, an apparatus for controlling the thermal uniformity of a substrate includes: a substrate support having a support surface to support a substrate thereon. A flow path is disposed within the substrate support to flow a heat transfer fluid beneath the support surface. The flow path comprises a first portion and a second portion, each portion having a substantially equivalent axial length. The first portion is spaced about 2 mm to about 10 mm from the second portion. The first portion provides a flow of heat transfer fluid in a direction opposite a flow of heat transfer fluid of the second portion.
Bibliography:Application Number: US201615050419