Monomer, organic layer composition, organic layer, and method of forming patterns

• Main Authors: Mun, Soohyoun, Namgung, Ran, Heo, Yumi, Kang, Sunhae, Kwon, Hyo Young, Nam, Younhee, Kim, Young Min
• Format: Patent
• Language: English
• Published: 30.07.2019
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; CORRECTING FLUIDS; DYES; ELECTROGRAPHY; FILLING PASTES; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; INKS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; USE OF MATERIALS THEREFOR; WOODSTAINS

The present invention relates to a monomer represented by chemical formula 1, an organic layer composition comprising the monomer, an organic layer prepared from the organic layer composition, and to a method for forming a pattern using the organic layer composition. The definition of the chemical formula 1 is the same as in the specification.