Reducing the effect of plasma on an object in an extreme ultraviolet light source

A first target is provided to an interior of a vacuum chamber, a first light beam is directed toward the first target to form a first plasma from target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target al...

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Bibliographic Details
Main Authors Rafac, Robert Jay, LaForge, Andrew David, Stewart, John Tom
Format Patent
LanguageEnglish
Published 09.07.2019
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ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
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Summary:A first target is provided to an interior of a vacuum chamber, a first light beam is directed toward the first target to form a first plasma from target material of the first target, the first plasma being associated with a directional flux of particles and radiation emitted from the first target along a first emission direction, the first emission direction being determined by a position of the first target; a second target is provided to the interior of the vacuum chamber; and a second light beam is directed toward the second target to form a second plasma from target material of the second target, the second plasma being associated with a directional flux of particles and radiation emitted from the second target along a second emission direction, the second emission direction being determined by a position of the second target, the first and second emission directions being different.
Bibliography:Application Number: US201816057101