Substrate imprinted with a pattern for forming isolated device regions

• Main Authors: Brug, James A, Taussig, Carl P, Zhao, Lihua
• Format: Patent
• Language: English
• Published: 16.04.2019
• Subjects: ELECTRICITY

An example provides a method for forming an apparatus including a substrate imprinted with a pattern for forming isolated device regions. A method may include imprinting an unpatterned area of a substrate with a pattern to form a patterned substrate having a plurality of recessed regions at a first level and a plurality of elevated regions at a second level, and depositing a first layer of conductive material over the patterned substrate with a plurality of breaks to form a plurality of bottom electrodes. The method may include depositing a layer of an active stack, with a second layer of conductive material, over the plurality of bottom electrodes to form a plurality of devices on the plurality of recessed regions isolated from each other by the plurality of elevated regions.