Image mask film scheme and method
A system and method for repairing a photolithographic mask is provided. An embodiment comprises forming a shielding layer over an absorbance layer on a substrate. Once the shielding layer is in place, the absorbance layer may be repaired using, e.g., an e-beam process to initiate a reaction to repai...
Saved in:
Main Authors | , , , , |
---|---|
Format | Patent |
Language | English |
Published |
18.12.2018
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A system and method for repairing a photolithographic mask is provided. An embodiment comprises forming a shielding layer over an absorbance layer on a substrate. Once the shielding layer is in place, the absorbance layer may be repaired using, e.g., an e-beam process to initiate a reaction to repair a defect in the absorbance layer, with the shielding layer being used to shield the remainder of the absorbance layer from undesirable etching during the repair process. |
---|---|
Bibliography: | Application Number: US201715443535 |