Lithographic apparatus and a method of operating the apparatus

A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures...

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Bibliographic Details
Main Authors Landheer, Siebe, Jansen, Bauke, Miranda, Marcio Alexandre Cano, Bruls, Richard Joseph, Tanasa, Gheorghe, Thomas, Ivo Adam Johannes, Jorritsma, Laurentius Catrinus, Noordam, Lambertus Dominicus, Van Der Lee, Maurice Martinus Johannes, Jansen, Hans, Meester, Arnout Johannes, Bruijstens, Jeroen Peter Johannes
Format Patent
LanguageEnglish
Published 11.12.2018
Subjects
ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
Bibliography:Application Number: US201514928891