Tool surface nano-structure patterning process

• Main Authors: Savu, Veronica, Auzelyte, Vaida
• Format: Patent
• Language: English
• Published: 04.12.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; DECORATIVE ARTS; ELECTROGRAPHY; HOLOGRAPHIC PROCESSES OR APPARATUS; HOLOGRAPHY; MATERIALS THEREFOR; MOSAICS; ORIGINALS THEREFOR; PAPERHANGING; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRODUCING DECORATIVE EFFECTS; TARSIA WORK; TRANSPORTING

Method of patterning a surface of an object or a tool with nano and/or micro structure elements having dimensions in a range of 1 nanometer to 1 millimeter, comprising the steps of producing a flexible mask with said nano or micro structure pattern formed on a surface of said flexible mask, chemically activating said surface of the flexible mask and/or said surface to be patterned of the tool, placing said patterned surface of the flexible mask in contact with said surface to be patterned of the object or tool, promoting a covalent bonding reaction between said patterned surface of the flexible mask in contact with said surface to be patterned, removing the flexible mask from the tool whereby a layer of said flexible mask remains bonded to said surface to be patterned of the tool, etching said surface to be patterned of the tool whereby the bonded layer of flexible mask material resists etching. An anti-activation mask defining a periphery of the surface area to be patterned, or peripheries of the surface area to be patterned if there are a plurality of separate portions of surface area to be patterned, is deposited on the flexible mask prior to placing the patterned surface of the flexible mask on the surface to be patterned. The anti-activation mask prevents bonding of the flexible mask to the surface of the object or tool in areas where the anti-activation mask is present.