Support apparatus, lithographic apparatus and device manufacturing method

• Main Authors: Overkamp, Jim Vincent, Fien, Menno, De Groot, Antonius Franciscus Johannes, Houben, Martijn, Lafarre, Raymond Wilhelmus Louis, Koevoets, Adrianus Hendrik, Jacobs, Johannes Henricus Wilhelmus, Hoogendam, Christiaan Alexander, Westerlaken, Jan Steven Christiaan, Van Beijnum, Maarten, Donders, Sjoerd Nicolaas Lambertus, Ten Kate, Nicolaas
• Format: Patent
• Language: English
• Published: 06.11.2018
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.