Plasma vacuum system having a completely enclosed chamber extruded profile

A vacuum system, such as the form of a plasma system, includes a vacuum chamber. The side walls of the vacuum chamber are configured in the form of a completely closed chamber extruded profile. A first end face of the chamber extruded profile is closed off with a plate. A second end face of the cham...

Full description

Saved in:
Bibliographic Details
Main Author Diener, Christof-Herbert
Format Patent
LanguageEnglish
Published 07.08.2018
Subjects
BASIC ELECTRIC ELEMENTS
BLASTING
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
DRYING
DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
HEATING
LIGHTING
MECHANICAL ENGINEERING
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
THEIR RELEVANT APPARATUS
TRANSPORTING
WEAPONS
Online AccessGet full text

Cover

More Information
Summary:A vacuum system, such as the form of a plasma system, includes a vacuum chamber. The side walls of the vacuum chamber are configured in the form of a completely closed chamber extruded profile. A first end face of the chamber extruded profile is closed off with a plate. A second end face of the chamber extruded profile, which lies opposite the first end face, has a reversibly openable and closable door. The door is fastened by at least one hinge pivotably to the chamber extruded profile. The side walls, which are fully closed transversely to the longitudinal axis of the chamber extruded profile, enable a simple and cost-effective production of the vacuum chamber. The vacuum chamber may be accommodated at least partially in a housing, which may likewise be configured at least partially in the form of an extruded profile.
Bibliography:Application Number: US201715405644