Method for manufacturing high purity glycol based compound

Provided is a method for manufacturing a glycol based compound. The method comprises agitating a mixture of a first glycol based compound, a hydrazide based compound, and a sulfonic acid based compound, and performing fractional distillation of resultant materials of the agitating to recover a secon...

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Main Authors Park, Young Jin, Park, Hong Sick, Kim, Bong Kyun, Park, Hyo Won, Jeong, Jae Woo, Lee, Sang Dai, Yun, Sang Moon, Yoon, Seung Ho
Format Patent
LanguageEnglish
Published 07.08.2018
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Summary:Provided is a method for manufacturing a glycol based compound. The method comprises agitating a mixture of a first glycol based compound, a hydrazide based compound, and a sulfonic acid based compound, and performing fractional distillation of resultant materials of the agitating to recover a second glycol based compound having a formaldehyde content of 0 ppm.
Bibliography:Application Number: US201514865493