Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method
There is provided a plasma processing apparatus including a susceptor, having a substrate mounting portion for mounting thereon a substrate; a focus ring including an outer ring and an inner ring; a dielectric ring; a dielectric constant varying device for varying a dielectric constant of the dielec...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
10.07.2018
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Subjects | |
Online Access | Get full text |
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Summary: | There is provided a plasma processing apparatus including a susceptor, having a substrate mounting portion for mounting thereon a substrate; a focus ring including an outer ring and an inner ring; a dielectric ring; a dielectric constant varying device for varying a dielectric constant of the dielectric ring; a grounding body positioned at an outside of the dielectric ring with a gap from a bottom surface of the focus ring; and a controller for controlling a top surface electric potential of the focus ring by controlling a current flowing from the susceptor to the substrate. |
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Bibliography: | Application Number: US201514721090 |