Optical arrangement of a microlithographic projection exposure apparatus
An optical arrangement of a microlithographic projection exposure apparatus includes a mirror element having a mirror substrate, and a reflection region formed on a surface of the mirror substrate. The arrangement also includes at least one actuator configured to move the mirror element in at least...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
26.06.2018
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Subjects | |
Online Access | Get full text |
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Summary: | An optical arrangement of a microlithographic projection exposure apparatus includes a mirror element having a mirror substrate, and a reflection region formed on a surface of the mirror substrate. The arrangement also includes at least one actuator configured to move the mirror element in at least one degree of freedom, and a mounting element, which acts on the mirror substrate. The mounting element alone holds the mirror element at least approximately in an equilibrium position, such that the at least one actuator is at least approximately free of forces in the equilibrium position. |
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Bibliography: | Application Number: US201715461853 |