Continuous process mechanism for double-effect plasma etching

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Bibliographic Details
Main Authors LI, YUAN-JI, LIU, PIN-JUN, CAI, MING-ZHAN
Format Patent
LanguageChinese
English
Published 21.10.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Bibliography:Application Number: TW202312208152U