Coupling rings, feed ring systems and plasma electrode assemblies

Systems and methods for controlling directionality of ion flux at an edge region within a plasma chamber are described. One of the systems includes a radio frequency (RF) generator that is configured to generate an RF signal, an impedance matching circuit coupled to the RF generator for receiving th...

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Bibliographic Details
Main Authors LUCCHESI, KENNETH, HOLLAND, JOHN PATRICK, MARAKHTANOV, ALEXEI, CHEN, ZHIGANG, KOZAKEVICH, FELIX, KELLOGG, MICHAEL C
Format Patent
LanguageChinese
English
Published 01.05.2024
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:Systems and methods for controlling directionality of ion flux at an edge region within a plasma chamber are described. One of the systems includes a radio frequency (RF) generator that is configured to generate an RF signal, an impedance matching circuit coupled to the RF generator for receiving the RF signal to generate a modified RF signal, and a plasma chamber. The plasma chamber includes an edge ring and a coupling ring located below the edge ring and coupled to the first impedance matching circuit to receive the modified RF signal. The coupling ring includes an electrode that generates a capacitance between the electrode and the edge ring to control the directionality of the ion flux upon receiving the modified RF signal.
Bibliography:Application Number: TW202110125469