TWI835928B

There is provided a solid-state imaging device having a configuration suitable for high integration. The solid-state imaging device includes a semiconductor layer, a photoelectric converter, a storage capacitor, and a first transistor. The photoelectric converter is provided in the semiconductor lay...

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Main Authors TAKAHASHI, RYO, KOGA, SHINICHI, FURUYA, SHOGO, CHIBA, YOHEI, SUZUKI, ATSUSHI, SAKANO, YORITO, SUENAGA, JUN, SHIOYAMA, TADAMASA, YOSHIKAWA, RYOICHI
Format Patent
LanguageChinese
Published 21.03.2024
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Summary:There is provided a solid-state imaging device having a configuration suitable for high integration. The solid-state imaging device includes a semiconductor layer, a photoelectric converter, a storage capacitor, and a first transistor. The photoelectric converter is provided in the semiconductor layer, and generates an electric charge corresponding to a received light amount by photoelectric conversion. The storage capacitor is provided on the semiconductor layer, and includes a first insulating film having a first electrical film thickness. The first transistor is provided on the semiconductor layer, and includes a second insulating film having a second electrical film thickness larger than the first electrical film thickness.
Bibliography:Application Number: TW20198142022