TWI833889B

This mask adapter is used in an exposure device that illuminates a mask supported on a stage and exposes a pattern formed in the mask, on to a substrate. The mask adapter is attached to the mask and comprises: a main body having a support section that supports the mask outside a region in which the...

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Bibliographic Details
Main Authors TERANISHI, SENA, OHKAWA, TOMOYUKI, ASAUMI, HIROYOSHI, HATTA, SUMIO, NAGANO, TOMOKAZU, KOMIYAMA, HIROKI, TAKAHASHI, DAISUKE
Format Patent
LanguageChinese
Published 01.03.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:This mask adapter is used in an exposure device that illuminates a mask supported on a stage and exposes a pattern formed in the mask, on to a substrate. The mask adapter is attached to the mask and comprises: a main body having a support section that supports the mask outside a region in which the pattern has been formed and a supported section supported by the stage; and a first section for detection, upon the main body and detectable by a detection unit in the exposure device. The first section for detection includes information pertaining to the mask adapter.
Bibliography:Application Number: TW20209103203