TWI829846B

To provide an antireflection member which not only has a low reflectance, but also is enhanced in scratch resistance, and an image display device comprising the antireflection member. An antireflection member 100 comprising a low refractive index layer 130 on a transparent substrate 110, in which th...

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Main Authors SUZUKI, SHO, MIZUNO, KIO, TADAKI, TAKANOBU, IWAHARA, KEITA, ENDOU, KEISUKE, HORIO, TOMOYUKI, WASHIO, ATSUSHI, WATANABE, OSAMU, KOZAKAI, TATSUYA, TAKEI, MICHIAKI
Format Patent
LanguageChinese
Published 21.01.2024
Subjects
ADHESIVES
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
CORRECTING FLUIDS
DYES
FILLING PASTES
INKS
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PHYSICS
POLISHES
USE OF MATERIALS THEREFOR
WOODSTAINS
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Summary:To provide an antireflection member which not only has a low reflectance, but also is enhanced in scratch resistance, and an image display device comprising the antireflection member. An antireflection member 100 comprising a low refractive index layer 130 on a transparent substrate 110, in which the low refractive index layer 130 includes a binder resin and silica particles 132 and 134, a ratio of Si element attributed to the silica particles, obtained by analysis of a surface region of the low refractive index layer 130 by X-ray photoelectron spectroscopy, is 10.0 atomic percent or more and 18.0 atomic percent or less and a ratio of C element under the assumption that the ratio of Si element is defined to be 100 atomic percent is 180 atomic percent or more and 500 atomic percent or less.
Bibliography:Application Number: TW20200100899