Method and system for the removal and/or avoidance of contamination in charged particle beam systems

• Main Authors: LODEWIJK, CHRIS FRANCISCUS JESSICA, KONING, JOHAN JOOST, MOOK, HINDRIK WILLEM, SMITS, MARC, LATTARD, LUDOVIC
• Format: Patent
• Language: Chinese; English
• Published: 01.12.2023
• Subjects: BASIC ELECTRIC ELEMENTS; CLEANING; CLEANING IN GENERAL; CONVERSION OF CHEMICAL ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; PERFORMING OPERATIONS; PHYSICS; PREVENTION OF FOULING IN GENERAL; RADIOACTIVE SOURCES; SEMICONDUCTOR DEVICES; TRANSPORTING

A charged particle beam system is disclosed, comprising:a charged particle beam generator for generating a beam of charged particles;a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles;a source for providing a cleaning agent;a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;wherein the charged particle optical element comprises:a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, andat least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmit